Modeling Ellipsometry for SrTiO3 MBE Epitaxial Films on Si(100)

Report No. ARL-TR-5435
Authors: Daniel M. Potrepka
Date/Pages: January 2011; 20 pages
Abstract: SrTiO3 (STO) was deposited onto silicon using Molecular Beam Epitaxy (MBE). In order to characterize the sample, x-ray diffraction (XRD) measurements were made for the film, and the optical constants were obtained from ellipsometry measurements. STO XRD showed that the STO was textured with rocking curve full width at half maximum (FWHM) 0.65 ± 0.07 degrees. Optical constants were obtained from fitting of the film's ellipsometric parameters, Psi and Delta, and the thickness of the STO film was determined to be 23.6 nm. Preliminary deposition of PbZr0.52Ti0.48O3 (PZT) showed the presence of only the 100 orientation for PZT XRD peaks.
Distribution: Approved for public release
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Last Update / Reviewed: January 1, 2011