Self-Assembling Nanomembranes Through Electrostatic Melt Processing of Copolymer Films

Report No. ARL-TR-2800
Authors: Eric D. Wetzel and Frederick L. Beyer
Date/Pages: August 2002; 27 pages
Abstract: Polystyrene-polyisobutylene-polystyrene (SIBS) block copolymer films have been electrostatically melt processed in order to induce a preferential orientation in the material microstructure. The results show that electrostatic melt processing is inducing some change in the microstructure, but full reorientation is not being achieved. The low dielectric contrast of the SIBS blocks as well as the relatively short electrostatic processing times are the likely causes of incomplete alignment.
Distribution: Approved for public release
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Last Update / Reviewed: August 1, 2002