Development of Antimicrobial Coatings by Atmospheric Pressure Plasma Using a Guanidine-Based Precursor

Report No. ARL-RP-0488
Authors: Jacqueline H. Yim; Michelle S. Fleischman; Victor Rodriguez-Santiago; Lars T. Piehler; Andr'e A. Williams; Julia L. Leadore; Daphne D. Pappas
Date/Pages: July 2014; 14 pages
Abstract: Antimicrobial coatings deposited onto ultra high molecular weight polyethylene (UHMWPE) films were investigated using an atmospheric pressure — plasma enhanced chemical vapor deposition (AP-PECVD) process. Varying concentrations of a guanidine-based liquid precursor, 1,1,3,3-tetramethylguanidine, were used, and different deposition conditions were studied. Attenuated total reflectance — Fourier Transform Infrared (ATR-FTIR) spectroscopy and X-ray Photoelectron Spectroscopy (XPS) were used to study the chemical structure and elemental composition of the coatings. Conformity, morphology, and coating thickness were assessed through SEM and AFM. Optimal AP-PECVD parameters were chosen and applied to deposit guanidine coatings onto woven fabrics. The coatings exhibited high antimicrobial activity against Escherichia coli (E. coli) and Staphylococcus aureus (S. aureus) based on a modified-AATCC 100 test standard, where 2—5 log reductions were achieved.
Distribution: Approved for public release
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Last Update / Reviewed: July 1, 2014