Applying LaPO4 Phosphor via Spinning for BetaPhotovoltaic Devices

Report No. ARL-TR-7269
Authors: Muhammad R Khan, Joshua R Smith, Kevin Kirchner, and Kenneth A Jones
Date/Pages: June 2015; 14 pages
Abstract: The semiconductor fabrication technique of spinning photoresist was modified and applied to the problem of creating a uniform coating of phosphor on a betaphotovoltaic (BPV) device. A mixture of phosphor was applied to 3 samples (Si, GaN, and a GaN die with devices fabricated on its surface), and all 3 samples were spun at various speeds using a spinner. A uniform coating of phosphor was not achieved for 2 reasons: the phosphor does not fully dissolve in water, and the phosphor mixture does not stick well to the samples.
Distribution: Approved for public release
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Last Update / Reviewed: June 1, 2015